Used TEL / TOKYO ELECTRON Clean Track Mark Vz #9314130 for sale

TEL / TOKYO ELECTRON Clean Track Mark Vz is a photoresist equipment designed for rapidly and accurately patterning wafers. It features a high-speed scanning capability combined with a 100-nm resolution, making it ideal for single or multi-level photomask manufacturing. This system consists of a high-powered, water-cooled ArF laser that runs at a wavelength of 193 nm. It is positioned adjacent to a center alignment unit, allowing precise alignment of the photomask with the wafer. The ArF laser output is delivered through an optics column, and the photomask pattern is projected onto the wafer from the corresponding location. The laser scanner is incredibly precise, allowing for very small features to be created without sacrificing accuracy. It is capable of achieving a 200-mm line-width with an accuracy of ± 10-nm. It has an operating speed of up to 1000-lines/sec, enabling it to produce prototype features faster than any other machine in its class. Additionally, the Mark Vz has various advanced safety features. The waterside cover prevents contact with the laser optics, and the spindle protection tool limits the laser exposure to the wafer. Safety sensors shut off the laser beam if the correct positioning of the wafer is not met, protecting the photomask from any damage. To facilitate easy maintenance, the asset is equipped with simple-to-use software. It automates many of the common maintenance tasks and provides detailed diagnostic information. Additionally, the model can be updated with the latest software package, ensuring a maximum lifespan of the equipment. All in all, TEL Clean Track Mark Vz is a highly sophisticated photoresist equipment designed for rapidly and accurately patterning wafers. Its reliable performance, precision accuracy, and safety features make it an ideal choice for fabricating precise photomask patterns.