Used TEL / TOKYO ELECTRON Clean Track #293587658 for sale

TEL / TOKYO ELECTRON Clean Track is a specialized photoresist equipment used in the lithographic process for the production of semiconductor devices. The system utilizes a combination of photolithographic and wet chemical processes to reliably pattern item substrates such as semiconductor wafers, flat-panel displays and LCDs. The unit basically consists of three major components. These are an exposure module, a washing module and a drying module. The exposure module is designed to perform lithographic patterning using a light source and masking plate. The light source used can be either a laser or ultraviolet light source, depending on the type of wafer. The masking plate contains the lithographic pattern to be transferred onto the wafer. The washing module is then used to remove the remaining photoresist residue from the wafer after it has been exposed. During this step a resist removal/etching chemicals are regulated and applied as well as a solvent (usually water) to remove any remaining photoresist residue. It is critical that this step is done accurately to ensure cleanliness and the accuracy of the pattern. The last step is the drying module. This step is used to remove any moisture on the surface of the exposed wafer. Again, it is important to have very low levels of moisture in order to ensure the accuracy of the lithographic patterning. During this step a drying agent such as alcohol or isopropyl alcohol is used to speed up the drying process. TEL Clean Track's photoresist machine quickly and accurately patterns wafers with reliable results. By utilizing a combination of state-of-the-art photolithographic and wet chemical processes, the tool ensures that exact patterns and clean surfaces are created on the target substrates. Furthermore, its modular design allows for easy customization and improvements in order to meet the specific needs of its users.