Used TEL / TOKYO ELECTRON Clean Track #293751150 for sale

TEL / TOKYO ELECTRON Clean Track is a photoresist equipment for processing wafers in the semiconductor fabrication process. The system is designed to provide a stable and uniform resist coating environment, which helps reduce the number of resist defects caused by environmental sources. The unit is composed of three core components: the Transport Exhaust Machine (TES), the Uniformity Area Control Tool (UACS), and the Dryer Area Interlock Asset (DAIS). The Transport Exhaust Model (TES) maintains a stable environment for the photoresist coating process by controlling the inlet/outlet pressurization of the entire processing area. The TES measures the pressure, controlling the inlet/outlet airflow, providing efficient airflow with low turbulence and minimal contamination. The TES helps ensure an improved particle distribution, which reduces resist defects. The Uniformity Area Control Equipment (UACS) is designed to provide uniformity of the resist coatings on the wafers. It utilizes a uniform air flow to maintain a uniform distribution of the photoresist across the surface area of the wafer. This aids in producing consistent, high-quality photoresist coatings on the wafer, improving yields and reducing defects. The Dryer Area Interlock System (DAIS) is designed to provide a safe and secure environment for the drying process. DAIS controls the inlet and outlet airflow within the drying chamber, ensuring the uniformity in resist coating across the entire wafer. DAIS also helps to enhance safety by monitoring the environment of the drying chamber for any potential hazards and will take appropriate action to protect the wafer if needed. TEL Clean Track is an advanced photoresist unit which provides reliable, consistent processing of semiconductor wafers. The machine consists of three main components which work together to provide uniform resist coatings, improved yields, and less defects. By controlling the inlet/outlet pressurization, uniform airflow, and the humidity in the processing area, the tool allows for improved resist coatings with minimal contaminants. The asset helps reduce the risk of resist defects, ensuring higher quality products and improved yields.