Used TEL / TOKYO ELECTRON Clean Track #9360709 for sale

TEL / TOKYO ELECTRON Clean Track
ID: 9360709
System.
TEL / TOKYO ELECTRON Clean Track is a precision photo-resist equipment designed to accurately and consistently deposit thin films of resist onto wafers. Developed for the production of high resolution circuits in a wide variety of microelectronic devices, TEL Clean Track has been in commercial use for nearly two decades. At the heart of TOKYO ELECTRON Clean Track's design is a specialized vacuum stack deposition chamber designed to precisely apply resist to a substrate. The chamber works in two stages: first, a specific flow of resist is created within the confines of the chamber and directed onto the substrate. Once the correct amount of resist is applied, the spreader is used to uniformly coat the substrate. The spreader works by ultrasound frequency waves that cause vibration and uniform deposition of the resist. Clean Track's design offers several key advantages over other systems. First, because resist is applied in uniform layers, it produces sharp and accurate circuit lines that are accurate down to 15 nanometers. This enables the production of high-density electronic components, and current-generation TEL / TOKYO ELECTRON Clean Track systems are capable of producing feature sizes as small as 8 nanometers. Additionally, due to its precise application of resist, the system can offer reliability consistency over millions of devices. To ensure optimal performance and reduce down-time, TEL has incorporated several features into TEL Clean Track unit. Among the most notable features are the advanced process monitoring and control systems which allow for real-time monitoring and adjustment of processing parameters. This allows for greater control over wafer quality and increases up-time. Additionally, a number of safety systems are incorporated, such as a modified air ejector to prevent dangerous particles from entering the chamber. In conclusion, TOKYO ELECTRON Clean Track provides the microelectronics industry with a reliable and precise photoresist machine. With accurate line widths down to 8 nanometers, state of the art process monitoring and safety systems, Clean Track offers unparalleled accuracy and reliability.
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