Used TEL / TOKYO ELECTRON Clean Track #9374899 for sale

TEL / TOKYO ELECTRON Clean Track is a photoresist equipment used in the semiconductor device fabrication process. It is designed to remove particles, organic and inorganic films, and other contaminants from the photoresist layer during device manufacturing. TEL Clean Track utilizes a high-intensity ionized gas to sweep contaminants away from the photoresist surface. This gas is delivered to the photoresist surface using a showerhead assembly that incorporates a gas delivery nozzle and an adjustable gas pressure regulator. The pressure regulator is adjustable to provide a range of gas delivery pressures that can accommodate a variety of photoresist layers, surface chemistries, and particle sizes. TOKYO ELECTRON Clean Track also incorporates high-performance pumps that circulate the ionized gas continually at an optimal cleaning pressure of 10 to 20 torr. The system uses a static filter to help remove suspended particles from the gas stream, as well as an adjustable gas pressure meter and regulator to provide consistent ionizing gas flow for the clean room applications. Clean Track unit includes a unique imaging machine which employs advanced optical technologies such as laser Illumination and charge-coupled device (CCD) imaging to monitor the photoresist layer for contaminants. It also includes dual-video recording capabilities for the observation of particles as well as contaminations not visible to the naked eye. Additionally, TEL / TOKYO ELECTRON Clean Track provides an overlay imaging facility for comparison of images taken before and after the photoresist application for improved process monitoring. Overall, TEL Clean Track is a robust, reliable photoresist tool boasting efficient particle removal, automated processes, and reduced manufacturing costs. It is used in the fabrication of semiconductor devices and is especially effective for removing small particles and organic contaminants from the photoresist surface. TOKYO ELECTRON Clean Track is designed to maintain the integrity of the photoresist layer and ensure process reproducibility and high yield.