Used TEL / TOKYO ELECTRON CS-600 #9380658 for sale

TEL / TOKYO ELECTRON CS-600 is a semi-automatic photoresist equipment designed for the processing of thin film deposition applications. It is a coat/punch system composed of a robotic wafer process unit, programmable air/vacuum reservoir, and a process chamber. This unit is ideal for fine-pitch lithographic applications due to its precision and accuracy. TEL CS-600 allows for the deposition of both thin film layers like photoresist, silica, aluminum, and titanium, all in a single process. The machine is capable of high-speed patterning and can easily accommodate both contact lithography and proximity photolithography. It is also capable of layer line spacer formation, which increases the ability of the tool to accommodate a variety of pattern geometries. TOKYO ELECTRON CS-600 is suitable for both semiconductor and photo-trough processes, such as photolithography, contact lithography, and proximity lithography. The wafer surface is exposed to a precise uniform coating of photo-sensitive materials and then subsequently patterned with flash exposure. CS-600 can accommodate various processes that require a pixel size from 10 microns to 24 microns. TEL / TOKYO ELECTRON CS-600 is equipped with a four-axial robotic arm that can be programmed to quickly and accurately manipulate the wafers. It allows fast pattern transfer and layer growth at a low cost due to its efficient scanning accuracy. This asset has a built-in adjustable vacuum chamber, which controls the level of the photo-sensitive layer to ensure a perfect bonding of successive layers. TEL CS-600 is equipped with a programmable air/vacuum reservoir that helps maximize the accuracy of the model's vacuum level at all times. The air/vacuum reservoir is adjustable so as to accommodate wafers of any thickness. Additionally, TOKYO ELECTRON CS-600 is also equipped with a gate valve to help keep the photoresist inside the reservoir and prevent it from oxidation. CS-600 is a highly efficient and reliable photoresist equipment that is designed to handle high-volume production of thin film layers. Its precise and accurate performance makes it an ideal choice for addressing fine-pitch lithography applications. The system's automated robotics and programmable air/vacuum reservoir make it extremely user-friendly and provide excellent results.