Used TEL / TOKYO ELECTRON CS-600 #9380677 for sale

TEL / TOKYO ELECTRON CS-600 is a comprehensive photoresist equipment used for photolithography processes. The system combines advanced resist technology with a fully automated substrate handling unit to provide a complete resist solution. TEL CS-600 includes a resist module, a vision module, and a substrate alignment module, making it an ideal solution for a wide range of applications. The resist module is designed for use of various types of resist materials. It is equipped with a resist nozzle, an anti-reflective coating (ARC) nozzle, and a spray dryer. The nozzle is capable of accurately controlling the application of the resist material, ensuring uniform deposition with a high degree of accuracy. Additionally, the nozzle is equipped with a leak detector, preventing resist leakage and contamination of critical substrate surfaces. The adjustability of the resist nozzle allows for the deposition of both positive and negative resist formulations on a variety of substrates. The vision module is designed to accurately recognize substrate coordinates and track their movement on the substrate stage. The vision module has a high resolution camera, allowing for precise recognition of substrate features. This enables accurate orientation of the substrate in relation to the resist nozzle and ARC nozzle during the application process. Additionally, the vision module is capable of automatically detecting substrate defects and providing feedback to the resist module in order to ensure that only substrates with acceptable integrity are used. The substrate alignment module helps ensure consistent substrate placement each time a substrate is placed on the substrate stage. It uses a combination of sensors and software to accurately position any substrate within a range of ± 0.1mm. This ensures that the application of the resist material is performed accurately. Additionally, this module allows for the convenient setup of large numbers of substrates in a single batch due to its automated nature. Overall, TOKYO ELECTRON CS-600 is an outstanding photoresist machine that provides superior uniformity and productivity. Its versatile resist application options allow for flexible production of a variety of substrates, making it an ideal solution for photolithography processes. Additionally, the advanced imaging and alignment capabilities ensure that substrates are accurately positioned for the resist application process, resulting in superior reproducibility.