Used TEL / TOKYO ELECTRON CS-600 #9380678 for sale

TEL / TOKYO ELECTRON CS-600 photoresist equipment is a tool for photolithography; a process commonly used in semiconductor fabrication. This system features a wafer alignment stage for accurately aligning wafer placements for exposure, a high-powered UV or laser light source, a motorized zoom lens for magnifying or reducing the image, and a highly advanced control unit. The wafer alignment stage consists of a vacuum chuck and three adjustable axes of motion that provide the operator with precise control of wafer position and orientation. An internal camera can be used to verify wafer position and alignment prior to exposure. This feature ensures that each wafer will be accurately positioned and exposed without the need for manual intervention. The machine is equipped with a light source that produces UV or laser light using a short arc lamp, depending on the application. The lamp and electrical control tool are designed to maximize arc lifetime and minimum maintenance requirements. The asset can use a wide range of filter patterns to optimize exposure parameters for various application. The motorized zoom lens is designed to provide the operator with the greatest possible degree of flexibility and control for exposure. It has a telecentric design, with an adjustable iris diaphragm to accurately control light intensity. It also offers adjustable focus and zoom, allowing the user to select an ideal image size. The control model is highly advanced and features a touch screen user interface and advanced diagnostics. It allows the operator to pre-program exposure parameters and store a variety of different settings for different applications. The equipment can also be integrated with other production equipment for enhanced process control. TEL CS-600 photoresist system is a powerful tool for semiconductor fabrication, offering precise wafer alignment, high-powered UV or laser light sources, adjustable focusing and zoom, and an advanced control unit. With its ability to automate certain processes, it provides users with an efficient and reliable photolithography experience.