Used TEL / TOKYO ELECTRON CS-600 #9380682 for sale

TEL / TOKYO ELECTRON CS-600 Photoresist Equipment is a versatile and reliable tool for patterning and etching substrates in semiconductor fabrication. This system utilizes a plasma-enhanced chemical vapor deposition (PECVD) technique to deposit a layer of photoresist on the substrate. TEL CS-600 consists of two main parts, the process chamber, and the source chamber. The process chamber is a tightly sealed chamber which houses a vacuum pump. The source chamber contains the components required for the process. The substrate can be loaded onto the process chamber, and once sealed, the pump begins evacuating the chamber. While under vacuum, the components in the source chamber are heated until the desired temperature. Then, different types of gases can be introduced into the chamber to begin the deposition and etching process. TOKYO ELECTRON CS-600 can be used to pattern and etch a variety of substrates, including substrates made from polysilicon, doped oxides, nitrides, SiGe/SiGe, and more. For etching, chlorine and fluorine-based gases are used. As for the photoresist layer, CS-600 utilizes a polymerization process involving a monomer and initiator gas to generate the photoresist. The polymerization process allows the tool to provide unparalleled performance for photoresist-processing applications. Furthermore, TEL / TOKYO ELECTRON CS-600 has several safety features built in. The unit is equipped with an internal safety valve, a purge machine, and an exhaust tool. These safety features can help to ensure that no hazardous substances are released into the environment during the processing. TEL CS-600 is an efficient and reliable tool for photoresist processing applications, and is designed to provide superior performance and usability in the semiconductor industry. With its versatile capabilities, TOKYO ELECTRON CS-600 Photoresist Asset is a favoured choice among semiconductor manufacturers.