Used TEL / TOKYO ELECTRON CS-600 #9380683 for sale

TEL / TOKYO ELECTRON CS-600 Photoresist Equipment is a powerful and reliable tool for photolithography processes in the semiconductor industry. Featuring a reliable integrated system for enhanced control of the photolithography process, TEL CS-600 is designed with cutting-edge optical performance and advanced wafer-handling capabilities. This unit offers superior optical performance, including a high numerical aperture (NA) for precise imaging, and superior laser irradiation power control for dynamic power adjustment. The machine is also equipped with advanced wafer handling capabilities including automated substrate alignment, wafer-to-wafer temperature uniformity, and optimized cooling speeds for controlled process temperatures. In addition, TOKYO ELECTRON CS-600 features a programmable power supply for maximum flexibility and an emergency stop function for safety. CS-600 also offers a number of different photoresist options to suit varying lithography needs. These include Single Mode Photoresists (SMPR), Multi Mode Photoresists (MMPR) and Proactive Photoresists (PPR). SMPR offers high levels of sensitivity and detail, along with excellent contrast. MMPR is ideal for complex photolithography tasks, and is capable of producing large patterns with photoresist baked into the substrate. PPR is a high-performance photoresist designed for 3D structures, and is capable of achieving advanced lithography results. TEL / TOKYO ELECTRON CS-600 has a compact configuration to ensure easy installation and operation. Additionally, it offers a wide range of standard and custom components for customization to specific customer needs. Additionally, the tool's modular design enables easy replacement of individual photoresist components. TEL CS-600 Photoresist Asset is a powerful and reliable tool for advanced lithography processes and can provide high levels of reproducibility and uniformity in process results. This model delivers highly reliable results for a wide range of photolithography processes and is well-suited for use in semiconductor manufacturing.