Used TEL / TOKYO ELECTRON CS-600 #9380686 for sale

TEL / TOKYO ELECTRON CS-600 is a photoresist equipment that allows users to directly pattern metal layers with photolithography. It is widely used in advanced semiconductor fabrication processes, such as the assembly of tiny crop sensors and structures, micro electromechanical systems (MEMS), interconnects, and optoelectronic devices. The system provides accurate exposure control, feature size control, and robust metal patterning, all in a single process. TEL CS-600 uses a proprietary photoresist called electron-chemical assisted thermal resist (ECAT) resist. This resist is designed to be compatible with various metals and substrate surface finishes. It is highly photosensitive to both visible light and electron beams, allowing users to control the resolution of patterns and features. In addition, TOKYO ELECTRON CS-600 is equipped with a mechanical stage that accurately orients the resist-coated substrate relative to the exposure light source. CS-600 features a wide selection of lithography tools, including a high-resolution image projector, halogen/mercury arc flood exposure sources, and a laser exposure source. These tools are designed to achieve extremely low line/space patterns, with a resolution of up to 0.8 micrometers (μm). The unit also has a high-resolution scan cell that enables simultaneous exposure at multiple angles. To ensure the highest level of accuracy, TEL / TOKYO ELECTRON CS-600 is equipped with a high-performance feedback machine. This tool continuously monitors the distances of the resist-coated substrate relative to the exposure source, and makes adjustments to ensure pattern alignments are within tolerance. The scan cell is also timed to reduce damage to the resist due to prolonged exposure. TEL CS-600 is also equipped with a sophisticated cleaning, coating, and drying asset. This sequenced model prevents contamination during process run-in, and ensures that the resist uniformity and optically clear end result. TOKYO ELECTRON CS-600 also includes a post-development line cleaning station that assists users in removing photoresist from the substrate after it is exposed and developed. Overall, CS-600 is a powerful and reliable photoresist equipment for the direct patterning of metal layers. Its versatility and robust features make it suitable for a wide range of photolithography applications.