Used TEL / TOKYO ELECTRON CS-600 #9380689 for sale

TEL CS-600Photoresist Equipment is a versatile and reliable solution for semiconductor fabrication needs. Photoresist is a material that is light sensitive and is deposited on the surface of a semiconductor wafer during the fabrication process for a variety of purposes. TOKYO ELECTRON CS-600Photoresist System allows engineers to precisely deposit photoresist onto a surface with ultimate control and accuracy. It uses a spray process which is achieved by computer-controlled liquid jets, allowing for precise spot-on deposition. This is ideal for applications with complex masking and patterning requirements. TEL / TOKYO ELECTRON CS-600Photoresist Unit is equipped with automated functions such as a wafer handling machine that can accurately transport wafers between processes, chamber cleaning programs to ensure process integrity and quality, and precise power sources for high yield processing. This tool also features advanced data logging capabilities for recording every critical parameter throughout the process. TEL CS-600Photoresist Asset offers a variety of settings to suit any need or process requirement. It is capable of process temperatures up to 300°C, vacuum settings up to 1 Torr, and a wide range of process times from two seconds to two hours. This model also offers control of chamber pressure, humidity, flow rate, gas composition, and more. TOKYO ELECTRON CS-600Photoresist Equipment is a reliable and trusted solution for any semiconductor fabrication need. Its user-friendly design coupled with advanced automation and data logging capabilities make it a great choice for any project. With its precision and flexibility, engineers can rest assured that their photoresist processing needs will be addressed with the utmost quality and reliability.