Used TEL / TOKYO ELECTRON CS-600 #9399469 for sale

ID: 9399469
Vintage: 1999
Plasma cleaner 1999 vintage.
TEL / TOKYO ELECTRON CS-600 is a photoresist equipment that provides powerful, precise control over the microelectronic lithography process. Features of the system allow for rapid processing of lithography layers with sub-micron feature resolution capabilities. This unit works with a pneumatic vacuum chuck to improve the uniformity of the resist coating. The platform itself is designed around closed-loop control to ensure a consistent thickness of the resist layer. The machine will also monitor the level of exposed areas during the resist depositing process resulting in a better quality process. The length of the exposure is also automatically adjusted by the tool in response to the defect pattern of the target circuits. This asset uses an optical projection model featuring high-resolution display and automated film overlap capabilities. In addition, TEL CS-600 platform is easily upgradeable, allowing users to customize their equipment's features to suit their lithography needs. The system also includes a developer mechanism to accurately control the formula and opening depth of the resist being used. This is done using several proprietary algorithms, which are also used to maintain uniformity performance. To further enhance uniformity, a Cleaner & Tracking Unit is integrated within this platform, to monitor and regulate the performance of the lithography. On-board diagnostics help to identify and correct any issues during the process, to ensure the results comply with exact specifications set by the user. Finally, TOKYO ELECTRON CS-600 is designed with many safety features that allow the user to pre-program the machine for maximum safety against accidental activation or improper exposure. In addition, the platform is self-monitoring, ensuring that all components of the tool are functioning properly. CS-600 photoresist asset provides powerful, precise control over the microelectronic lithography process enabling rapid processing of lithography layers with sub-micron feature resolution capabilities. This reliable, agile model is fully upgradeable, and comes with diagnostic, tracking, and safety features to ensure the highest quality lithography result.
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