Used TEL / TOKYO ELECTRON CS450 #9267387 for sale

TEL / TOKYO ELECTRON CS450 is a photographic resist equipment capable of a wide range of precise patterning operations. This system is designed to perform processes such as lithography, spin-on coating, and wafer process development with accuracy and efficiency. It offers a wide variety of functions, including the capability of achieving even fine patterning, due to its highly advanced servo control capabilities. The unit has a compact, highly efficient design and is easy to integrate into a lithography environment. Its intuitive user interface makes operation and maintenance convenient. It is equipped with an advanced optical machine that allows long working gas lifetime. The optimized numerical control with high feed speed, reduces the time required to achieve the desired pattern. The tool offers outstanding resisting capabilities, even in challenging substrates. Three types of processing are available; manual lithography, dissolution type and electroless plating. All of these processes are executed with a combination of high accuracy and speed to achieve desired results. The monitoring and control capability of the asset allows for temperature, humidity, and chamber pressure to be monitored and controlled precisely. This ensures an ideal working environment for both the coating process and the resist process. The model is equipped with a variety of features that make it the ideal choice for advanced process development. It offers a wide variety of features, including an advanced spin-on coating equipment with optimized pressure and temperature control. It also provides an increased number of recipe steps, which allows users to execute a variety of different coating and patterning operations. TEL CS450 is an advanced photoresist system designed to achieve precise patterning with speed and ease. Its versatile feature set makes it an ideal choice for advanced process development in both industrial and research settings. The unit can be used in applications such as lithography, deposition, and etching across a variety of substrates. Its intuitive user interface, advanced optical machine, and improved control capabilities make it perfect for applications requiring high accuracy and repeated process cycles.