Used TEL / TOKYO ELECTRON CS450 #9269591 for sale

TEL / TOKYO ELECTRON CS450 Photoresist Equipment is a powerful, user-friendly resist processing system for advanced lithography processes. Designed for consistency and accuracy, TEL CS450 is capable of handling complex patterning requirements for next generation semiconductor technologies. This unit supports applications such as deep UV (DUV) and extreme ultraviolet (EUV) lithography with single and double exposure steps. TOKYO ELECTRON CS 450 is designed to work with chemically-amplified, negative tone photoresists. This machine's advanced spin technology optimizes process variability and enables excellent uniformity and productivity, even with smaller pattern designs. TEL / TOKYO ELECTRON CS 450 features integrated machine vision, enabling automated inspection and identification of defects. TEL CS 450 is equipped with programmable process parameter settings. This allows for accurate, repeatable results. The tool can be operated manually or in automatic mode. The automatic mode can be used for rapid, reproducible resist processing, even on complex resist structures. The asset also provides excellent temperature control. Process temperatures can be accurately controlled from 5 to 80°C, while the substrate temerature can be maintained between 5 and 60°C. An optional fast thermal zoning is also available, which can significantly reduce the time needed to process small-geometry wafers. The model includes an interactive graphical user interface that enables easy and intuitive operation. In addition, a recipe editor is available that allows users to create customized recipes and store them in TOKYO ELECTRON CS450 database. The user prompts are intuitive, making the operation simpler and more user friendly. The equipment also includes a built-in high-performance resist tracking system, which provides real-time monitoring of process results. This allows operators to correct any variations that may occur during the different stages of the resist processing process. Overall, CS450 Photoresist Unit is a powerful, user-friendly resist processing machine for advanced lithography processes. Its advanced spin technology, temperature control settings, user-friendly graphical user interface, and real-time resist tracking tool offer exceptional uniformity and process stability. This asset is capable of addressing the most challenging process requirements, offering users unparalleled accuracy and repeatability.