Used TEL / TOKYO ELECTRON CS450 #9269596 for sale

TEL / TOKYO ELECTRON CS450
ID: 9269596
System CANON MPA 3000 Robot.
TEL / TOKYO ELECTRON CS450 is a photoresist equipment designed for use in industry-scale semiconductor fabrication processes. TEL CS450 is a fully automated system designed for the accurate, repeatable and reliable application of photoresist to wafers. The unit can process both positive- or negative-tone photoresist with automated precision. The machine uses a patented laser-sensor set that scans the wafer surface, applying the photoresist in layers that have predetermined uniformity in thickness, line widths and breadth. The tool integrates a range of advanced technologies. TOKYO ELECTRON CS 450 automates the application of the photoresist in three distinct stages; resist spinner, laser writer and temperature controller. The resist spinner performs the initial application phase, spinning the wafer and applying the photoresist evenly and accurately. The laser writer applies the pattern to be etched onto the wafer's surface, this is done using a series of lasers that emit coherent light to draw out a specific pattern. Finally, the temperature controller is tasked with maintaining a stable temperature in the chamber and across the wafer in order to ensure a consistent and repeatable application of the photoresist. In order to guarantee the highest levels of accuracy, reliability and uniformity during the application process, TEL / TOKYO ELECTRON CS 450 is equipped with several advanced automated systems. This includes 'self-evaluation' that checks that all of the asset's components are functioning correctly before performing each operation, as well as an auto-feedback model that can detect and compensate for potential source of error. In addition, sophisticated filtering systems remove contaminants from the air before beginning each process. TOKYO ELECTRON CS450 is a proven and reliable equipment, which has been used in the creation of cutting edge nanotechnology devices. Its advanced technologies provide an efficient and user-friendly solution for photoresist application in the manufacture of semiconductor devices.
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