Used TEL / TOKYO ELECTRON CS450 #9269597 for sale

TEL / TOKYO ELECTRON CS450 is a photoresist equipment designed to automate the process of creating microstructures on semiconductor wafers. The system consists of a special exposure lamp, a rotating wafer stage, a gas purge unit, and a vacuum machine for rapid and precise processing of wafers. The exposure lamp, a metal halide lamp, emits short-wave ultraviolet rays with a wavelength of 351nm for accurate imaging of microstructures. The wavelength and irradiance of the lamp can be set for specific exposure levels, allowing for accurate and consistent imaging. The rotating wafer stage is a motor-driven turntable that rotates the wafer at 1800rpm and sets the exposure time at user-defined increments. The stage has a vibration-damping mechanism that ensures smooth operation and precise positioning accuracy. This allows for precise placement of microstructures on the wafer. The gas purge tool is used to achieve the high vacuum levels necessary for photoresist processing. A special highefficiency turbo molecular pump provides the necessary vacuum and scrubbing of the process chamber. This ensures that no contaminants are introduced into the chamber during processing. The vacuum asset is comprised of a closed-loop model with several sensors, which monitor the pressure, temperature, and partial pressure of each process chamber. The equipment allows for precise control of the vacuum, enabling the accurate operation of the photoresist system. Overall, TEL CS450 is a reliable tool for photolithography processing. Its combination of advanced exposure lamp technology, sophisticated wafer stage control, and precise vacuum unit regulation allows for accurate fabrication of microstructures on semiconductor substrates.