Used TEL / TOKYO ELECTRON CS450 #9269600 for sale

TEL / TOKYO ELECTRON CS450 Photoresist Equipment is a robust piece of equipment designed for precise photoresist coating. This system enables the coating of specific materials onto a substrate, which allows for the implementation of large-scale device fabrication in the photolithography process. At the heart of the unit is a carbon dioxide laser source that provides energy for photoresist coating. Unlike other photoresist systems, TEL CS450 machine is equipped with dual laser sources. This dual laser tool is designed to minimize the amount of energy needed to coat a substrate evenly, helping to reduce waste and contamination. The asset also includes a closed-loop facility process, which continuously monitors the photosensitive material so that repeatable results can be obtained. This closed-loop model also allows for substrate uniformity, increasing the accuracy of results. In addition to the laser source and process control equipment, TOKYO ELECTRON CS 450 photoresist system includes a variety of applicators. These applicators allow for precise positioning of the source material onto the substrate. The applicators have a range of nozzles in order to accommodate different types of photosensitive material. This ensures that the correct material is applied in the correct location on the substrate. TEL / TOKYO ELECTRON CS 450 unit also features PM3D scan head technology. This advanced scanning technology has been designed to provide speedy and precise deposition of photosensitive material onto substrates. This technology involves a three-dimensional scan, allowing for extremely accurate coating of the photosensitive material on the substrate. Finally, TOKYO ELECTRON CS450 machine also includes a variety of safety features to ensure that users remain safe while operating the tool. Among the safety features are an emergency stop switch, a laser safety shield, and double door locks to protect against possible contamination of the photosensitive material. Overall, CS 450 Photoresist Asset is an invaluable tool in the photolithography process. Its combination of laser source, process control model, applicators, and PM3D scan head technology enables precise and repeatable photoresist coating on various types of substrates. Combined with its safety features, CS450 equipment is a great choice for large-scale device fabrication.