Used TEL / TOKYO ELECTRON CS450 #9269604 for sale

TEL / TOKYO ELECTRON CS450 is a technologically advanced photoresist equipment designed to create lithography masks used in semiconductor manufacturing. The primary purpose of the system is to transfer patterns of circuit diagrams to photomasks with extreme precision. The unit incorporates high resolution projection optics, precise stage and motion control, a high-efficiency and clean process chamber, and sophisticated closed-loop control algorithms. These features enable it to provide superb image-to-image registration accuracy, making it an indispensable tool for nanometer-level lithography. TEL CS450 machine features a 1600x1200 DPI 14 micron resolution light engine that offers superior image quality and accuracy. This light engine is coupled with a 300mm-square substrate X-Y staging tool capable of obtaining 3-sided registration accuracy of +/-15um. This precision allows patterns to be accurately imaged across wafers. In addition, the asset also features a state-of-the-art vacuum model, which is integrated with a gas cleanliness control unit and a carbon dioxide dry-pumping equipment. This vacuum system ensures that the chamber contains only clean and inert gases during processing, thereby ensuring high yield performance. Furthermore, TOKYO ELECTRON CS 450 unit also incorporates a range of sophisticated control systems and algorithms designed to ensure high precision operation. One of these control systems is its advanced motion control, which allows the stage to precisely position wafers with sub-micron accuracy. It also features advanced algorithms for beam control and exposure calibration, which help ensure the correct exposure and focus of the lithographic masks. Finally, the machine features a comprehensive user interface, which provides a convenient environment for operation and maintenance. All in all, CS 450 is a highly advanced photoresist tool, capable of creating precise lithomasks with extreme accuracy and reliability. Its high resolution light engine, advanced motion control asset, sophisticated control algorithms, and comprehensive user interface make it an invaluable tool for nanometer-level lithography, and its features make it an ideal choice for any semiconductor manufacturing application.