Used TEL / TOKYO ELECTRON CS450 #9269605 for sale

TEL / TOKYO ELECTRON CS450 is a modular, all-in-one, photoresist equipment from TEL (TOKYO ELECTRON). This system is designed for a variety of photolithography applications, offering high accuracy and repeatability. TEL CS450 is capable of processing large substrates from 4-inch wafers to 450mm wafers. It offers fast turnaround times and minimal chemical usage, making it a cost effective solution for many production environments. TOKYO ELECTRON CS 450 utilizes advanced optical technology that achieves repeatable accuracy with a minimum of maintenance. It includes a telecentric projection lens that projects light with great evenness and a quad linear mirror (QLM) that provides stable illumination across large substrates. The unit can be configured with two different alignment systems, TEL / TOKYO ELECTRON RC-STEP or the RC6000, depending on the specific requirements of the application. CS450 also includes several key technologies to reduce particles, particularly a patented membrane gasket and sticky mat that securely contain particles on the wafers. This ensures high throughput and yields even on challenging substrates. Internal air filtration prevents the accumulation of particles on the optical elements and ensures that only clean air is flowing within the machine. In addition to its high accuracy, TEL / TOKYO ELECTRON CS 450 is also highly flexible and can process a wide range of materials, including common photoresist, transparent film, and other optical materials. It also features a user-friendly interface, allowing users to quickly set up new processes and decomission existing ones. This makes it easier to accommodate changing requirements and different production methods. Overall, TOKYO ELECTRON CS450 is an ideal solution for fast, accurate, and efficient photolithography. With its many features and innovations, it offers the highest level of performance and flexibility. Highly configurable and cost effective, TEL CS 450 is the perfect choice for any photolithography application.