Used TEL / TOKYO ELECTRON CS450 #9269606 for sale

TEL / TOKYO ELECTRON CS450 is a photoresist equipment designed to perform high-precision etching and patterning of substrates such as Silicon wafers and other thin films. It is an advanced system based on the latest state-of-the-art technology and design principles. TEL CS450 features the Diamond-Like Carbon Source Unit (DLCS), a state-of-the-art source of light-sensitive chemicals used in photoresist processes. DLCS is a laser-induced, high-intensity source of electron beam evaporation, capable of producing accurately controlled doses of chemicals on a micron scale. The DLCS also features advanced optical functions, such as beam collimation, energy stabilization, and light absorption. The unit also features the Substrate Treatment Machine (STS), an advanced tool for cleaning, reconditioning, and drying of substrates after they have been exposed to the DLCS. TOKYO ELECTRON CS 450 is designed to work with various types of substrates, including Silicon, Quartz, and Sapphire. The asset is capable of controlling etch depths and the patterning of lines, dots, and other shapes with precision, with etch depths of up to 50 microns and line widths of up to 300 nm. Various functions, such as edge rounding, laser scribing, line-shaping, and charge accumulation, can be automated in the model, providing higher precision than is possible by hand. The equipment is also designed to provide biosafety and efficiency in operation. It comes with an integrated controller, allowing the user to control process cycles and parameters remotely. This means that the user can reduce the risk of contamination and damage to the substrate and ensure that the etching and patterning process is performed with precision and quality. The controller also has safety features, such as thermal protection, which prevents the system from over-heating during operation, and vibration monitoring, which prevents abrupt changes in the substrate surface during processing. CS 450 offers a comprehensive range of etching and patterning functions, including etch depth and line width adjustment, high-precision line shaping, edge rounding, laser scribing, and charge accumulation. Additionally, the unit is capable of producing a full range of photoresist structures, including micro-electro-mechanical systems (MEMS), organic light-emitting diodes (OLEDs), printed circuit boards (PCBs), and radio frequency (RF) devices. It is ideal for a wide range of applications, including the manufacture of semiconductors, displays, and sensors.