Used TEL / TOKYO ELECTRON CS450 #9269618 for sale

TEL / TOKYO ELECTRON CS450 photoresist equipment is a state-of-the-art photolithography tool for semiconductor wafer fabrication. The system is composed of four main components: the Photoresist Coater Module, Expose Module, Develop Module, and Stripping Module which carry out photoresist coating, lithography pattern transfer, pattern development, and photoresist stripping respectively. The unit's automated controls enable an optimal coating of photoresist, ensuring uniform and repeatable coverage. With the dedicated software, a wide range of layers can be processed and accurately managed. The application-specific exposure patterns can range from simple geometric shapes, lines, or circles to sophisticated microstructures. By precisely controlling exposure parameters, TEL CS450 is capable of practicing advanced pattern design. The Photoresist Coater Module is composed of a series of tanks, a spin head, and a spin controller. The spin head and controller work together to accurately control both spin speed and acceleration. Once programmed appropriately, the controller automatically dispenses the photoresist onto the wafer surface, evenly coating the surface before the lithography process begins. The mechanism also ensures uniform thickness and limits potential contamination. The Expose Module implements vacuum contact aligning with a high degree of precision. The tracking machine resembles an auto-focus camera and ensures minimal resolution error and high accuracy. The controller allows for precise control of dose, focusing, alignment, sub exposure, and bake. The Develop Module consists of two tanks, a wafer holder, and a heater. An integrated peripheral heater warms the photoresist and deactivates the resist oven ensuring the desired development results. The Stripping Module uses a combination of RF plasma and wet etching to contour and remove photoresist. Combined, these four processes enable a highly accurate and repeatable transfer of patterns into wafer surfaces. By controlling and managing exposure parameters, TOKYO ELECTRON CS 450 positions itself as a high-end, high-resolution photoresist tool for semiconductor wafer fabrication.