Used TEL / TOKYO ELECTRON CS450 #9269620 for sale

TEL / TOKYO ELECTRON CS450 is a high-precision photoresist equipment produced by TEL Limited. It is designed for applications in the manufacturing of semiconductors, flat panel displays, and other leading-edge electronics. TEL CS450 system consists of two components: the microscope and the lithography tool. The microscope is designed for imaging and for critical overlay alignment of the mask pattern onto the wafer. It features an Automated Lens Unit (ALS) that allows for high throughput and high accuracy. The lens machine has a numerical aperture of 1.5 and magnification of up to 1,400X, and is completely integrated with the lithography tool. The lithography tool features a high-resolution imaging tool that uses a proprietary laser-beam writing process to apply photoresist to the wafer. It also has a high-precision mask centering asset that allows for accurately aligning the mask to the target area of the wafer. The model uses an integrated standard photomask measuring and alignment equipment for precise mask alignment, and has dynamic loading and alignment capability to enable rapid processing. TOKYO ELECTRON CS 450 system provides reliable and repeatable results for the creation of high-precision patterns. It is built for reliable operation and features modular components that can be easily replaced or upgraded as desired. It has advanced unit monitoring capabilities that include automatic machine fault detection and alarm management. CS 450 tool offers flexibility and scalability to meet different customer requirements. It is capable of handling various types of substrates, such as 300mm wafers, and is designed with a wide range of production automation and control functions. Overall, CS450 is a reliable and precise photoresist processing asset, well suited for applications in the fabrication of advanced integrated circuits and other leading-edge electronics. It offers high resolution, flexibility, and scalability to meet the requirements of different production environments.