Used TEL / TOKYO ELECTRON CS450 #9269621 for sale

TEL / TOKYO ELECTRON CS450 photoresist equipment is an advanced high speed maskless imaging system that is used in the photolithography process for semiconductor and circuit board applications. The unit utilizes a high speed imaging laser to optically expose patterns on photoresist coated wafer or boards. It is capable of high throughput and accuracy in complex pattern formation that meets the stringent need in the electronic and microfabrication industry. The machine incorporates a full range of motorized positioning stages and control systems to ensure accurate control and repeatable positioning. The wafer or board is held securely in a vacuum chuck that can be engaged through the use of a controller. Substrate homogeneity and vacuum level are monitored throughout the imaging process to ensure high precision and repeatability. The imaging laser eliminates the need for masks and masks making process making the tool faster and more cost effective. The use of the laser makes the asset suitable for both direct imaging as well as indirect imaging techniques. A wide wavelength range of UV (191 - 397nm) and IR (820 - 1700 nm) laser sources can be used for different applications. The model also comes with wafer or board cleaning capability with advanced wet processing technology. It includes a fully automated chemical management equipment as well as programmable control to break down and transfer chemical solutions and monitor exhaust flow. TEL CS450 can be designed and automated to the specific requirement of each process. Users can configure automation programs for any length of time, and the photo exposure and development can be completed in a single run without manual intervention. The built-in precision control and monitoring features ensure accuracy and repeatability of the imaging results. Overall, TOKYO ELECTRON CS 450 photoresist system is a reliable and efficient imaging platform that can be used for a wide range of applications. It is an ideal unit to create complex patterns that can be used in the photolithography process for semiconductor or circuit board applications.