Used TEL / TOKYO ELECTRON CS450 #9269622 for sale
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TEL / TOKYO ELECTRON CS450 is a state-of-the-art photoresist equipment developed by TEL, a leading provider of semiconductor manufacturing equipment and services. It is designed to help reduce operational costs and shorten the processing time of photoresists used in semiconductor manufacturing. TEL CS450 system employs an advanced exposing technique, known as Laser Induced Forward Transfer (LIFT). This technology involves transferring an exact pattern from a laser light source onto a wafer's surface. The use of an advanced laser light ensures that the transferred pattern is exact and does not generate any blur or distortion. TOKYO ELECTRON CS 450 unit provides highly accurate patterning with amazing process control capability. It offers a wide range of exposure options such as Active Alignment, Uniform Exposure, and Multi Dimension Exposure that allow users to precisely control the light exposure and timing in the production process. Moreover, CS 450 machine is suitable for single wafer applications as well as batch processing, making it suitable for various production scenarios. TOKYO ELECTRON CS450 is also equipped with an advanced tracking and monitoring tool. This asset is designed to detect any potential imperfections and abnormalities in the process before they become serious problems. The in-built monitoring systems also enable the users to quickly locate any irregularly exposed areas or patterns. TEL / TOKYO ELECTRON CS 450 model is designed for top performance and reliability. It is powered by the latest VLSI technology, and is extremely reliable in terms of both hardware and software. Furthermore, TEL CS 450 equipment is designed based on very energy efficient designs that save energy costs and help protect the environment. Overall, CS450 system is an ideal solution for the semiconductor industry, providing high performance patterning solutions with amazing process control capabilities. The unit also supports cost savings, energy efficient designs, and offers leading-edge process tracking capabilities. The machine is reliable and advanced, making it capable of handling any requirements in the field of photoresisting.
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