Used TEL / TOKYO ELECTRON CS450 #9269623 for sale

TEL / TOKYO ELECTRON CS450 Photoresist Equipment is a multi-functional evaluation unit designed for the evaluation of photoresist pattern formation and thin-film patterning on the substrate. TEL CS450 system enables advanced control and independent management of exposure, development, resist reflow, and post-exposure bake (PEB) processes. It is used in the fabrication of semiconductor devices, including organic, liquid crystal display, and photomask. TOKYO ELECTRON CS 450 unit has an advanced control module programmed with proprietary algorithms to simplify, speed up, and precisely process photoresist onto a substrate. Its exposure module controls the photolithography waveform, allowing for high contrast imaging and low stress applied to the photoresist layer. Furthermore, it is equipped with a resist reflow machine that allows for the application of a special heated temperate to the photoresist layer, enabling thicker and more uniform deposition. Additionally, CS 450 tool is outfitted with an automatic process optimization feature which allows for the evaluation of critical parameters, such as exposure dose, development time, and PEB conditions, in order to achieve optimal patterning of the photoresist on the substrate. This optimization feature significantly reduces the number of human-errors during experimentation, thereby improving overall productivity. Finally, TEL / TOKYO ELECTRON CS 450 asset has advanced monitoring and logging capabilities which allows operators to track the entire resist processing process, thus ensuring that the photoresist is applied according to specification. CS450 model is ideal for industrial applications, such as high-volume production of electronic components, as it provides a reliable and cost-effective solution to image transfer.