Used TEL / TOKYO ELECTRON CS450 #9269627 for sale

TEL / TOKYO ELECTRON CS450 Photoresist Equipment is a piece of high-end, sophisticated equipment used in the semiconductor industry for deposition of photoresist. The system uses multiple modulations for deposition such as evaporation, sputtering, and spin-coating. It has the ability to achieve uniform coating on substrates quickly and with a high degree of accuracy. The large substrate size offers high throughput, and process compatibility up to 4500mm. TEL CS450 unit also includes an in-situ resist monitoring machine, which allows for real time control of the resist thickness on the substrate. The evaporator tool utilizes electron beam heating for rapid thermal evaporation for most materials, and includes a natively integrated filament power supply for safe, effective operations. The evaporator asset also has an efficient cryopump which helps with rapid evacuation of substrates during processing. The model also includes a multi-source sputter module which offers both argon and xenon sputtering, as well as an advance sputter source with independent metering for multi-material deposition. The precision of TOKYO ELECTRON CS 450's spin-coating equipment is complemented by its high uniformity, which enhances the system's ability to quickly and accurately deposit photoresist on the substrate. The spin-coater also includes a two-head drive unit which allows for precise control on the speed and uniformity. The machine's uniformity and accuracy is further augmented by the tool's active autorotation module, which utilizes an advanced motion controller to maintain uniform spin speed. CS 450 Photoresist Asset is a reliable, efficient deposition model which provides both accuracy and high throughput. Its efficient dissipated defenses allows for safe substrate mirroring during the process, and its in-situ resist monitoring equipment allows for timely adjustments in order to meet deposition requirements. Additionally, its sputter and evaporation sources provide a wide range of process compatibility, and can offer high uniformity and rapidly deposition operation while maintaining excellent photoresist quality.