Used TEL / TOKYO ELECTRON CS450 #9352213 for sale

TEL / TOKYO ELECTRON CS450 photoresist equipment is an advanced lithography platform designed for precise and accurate patterning of thin film and planarizing layers. The system is capable of delivering high throughput and high-resolution imaging for both hard and soft photoresist applications. The platform is equipped with both UV exposure and spin-coater capabilities. The UV exposure unit enables users to accurately pattern from 270nm to 590nm feature sizes, while the spin-coater allows for precise deposition of thin film and planarizing layers. This combination of features delivers excellent pattern transfer quality. Process control is enabled through a variety of hardware components, including an intelligent control machine and a layer control tool. These components work together to provide precise and consistent process control, allowing the asset to reliably deliver uniform results with minimal variation. The model utilizes advanced vision recognition technology to identify and align features when scanning substrates. This ensures accurate alignment during exposure, as well as enabling high-precision pattern transfer to the substrate during coating. It also ensures that the equipment will always process with maximum accuracy. The exposure sheet is also adjustable and can be quickly changed to accommodate different substrate sizes and exposure requirements. This allows users to quickly make changes to their processes when needed. TEL CS450 photoresist system is an advanced and reliable platform for lithography and thin film deposition. The unit's combination of hardware and software components helps deliver consistent and accurate results for both hard and soft photoresist applications. Its ability to reliably produce accurate patterns with minimal variation ensures optimal yield and performance of devices.