Used TEL / TOKYO ELECTRON CS450 #9393333 for sale

TEL / TOKYO ELECTRON CS450
ID: 9393333
Vintage: 1999
Track system Does not include titler and aligner 1999 vintage.
TEL / TOKYO ELECTRON CS450 is an advanced photoresist equipment used in semiconductor fabrication. TEL CS450 is ideal for achieving very precise physical, electrical and optical properties on integrated circuit (IC) devices. It is a fully automated system which quickly and uniformly coats parts and substrates with a thin layer of photoresist. The photoresist is a photosensitive material that is used to create patterns on the surface of the IC devices. It is first applied in a uniform thin layer, then exposed to UV light using a photographic mask, which forms a pattern of light on the resist. The resist interacts with the light by becoming hardened in the areas exposed. Any exposed areas that become hardened can then be washed away, leaving behind the pattern of the mask. TOKYO ELECTRON CS 450 combines hydrogen fluoride (HF) vapor deposition and spin coater technologies to provide superior thin layer adhesion for photoresist applications. The spin coater is also used to apply coatings with uniform thicknesses, enabling the process to produce repeatable results. CS 450 unit includes a peripheral control board, central controller, and automated vacuum-based chemical delivery machine. The peripheral control board is used to control the automatics of the tool, while the central controller is responsible for controlling the overall operations. The chemical delivery asset ensures accurate dosages of chemicals such as developer, activator, and remover are delivered to the substrate. CS450 features both a 10"and 12" wafer processing capability with adjustable substrate holder. The model can process a range of wafer sizes, from 2" to 12" diameter. TEL / TOKYO ELECTRON CS 450 also enables high speed application of photoresist with its integrated motorized spin coater. TEL CS 450 has the capability to support multiple wafer sizes as well as the ability to process up to 24 wafers at once. This makes the equipment ideal for large scale production purposes. Additionally, TOKYO ELECTRON CS450 is highly configurable with its automated processes which can be easily changed or adapted to specific needs. In conclusion, TEL / TOKYO ELECTRON CS450 is an automated photoresist system designed for precise pattern formation on IC devices. It combines advanced HF vapor deposition and spin coater technologies with a vacuum-based chemical delivery unit for superior thin layer adhesion and uniformity. TEL CS450 supports multiple wafer sizes and is highly configurable with its automated processes for large scale production.
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