Used TEL / TOKYO ELECTRON CS450 #9411469 for sale

TEL / TOKYO ELECTRON CS450 is a highly advanced and sophisticated photoresist equipment designed for semiconductor industries. This system utilizes ultraviolet light in order to transfer patterns onto circuitry. Photoresist is a light sensitized material which is used to form insulated layers that are deposited onto an integrated circuit. This unit not only enables accurate patterning during the fabrication process, but also ensures that these patterns are consistent and reliable. TEL CS450 utilizes a comprehensive set of features and specifications to ensure effective and efficient patterning of integrated circuits. This includes a large and wide exposure stage, a high‐resolution projection exposure machine and an advanced light source. Furthermore, it offers several additional features including a high‐resolution mapping mode, a wafer mapping tool, die‐to‐die inspection and support for photoresist types. The asset's light source consists of two stages with different spectral emission. For example, the exposure stage uses ultraviolet light to expose photoresist coated wafers, while the mapping mode utilizes a low energy, laser‐like light to trace circuit line width. This ensures extremely accurate pattern alignment and high throughput. Furthermore, the model can be utilized to support a variety of different photoresist types and characteristics, enabling users to fine tune the process to their application's needs. TOKYO ELECTRON CS 450 equipment is highly versatile and facilitates accurate and fast patterning, even for complex and high‐end applications. It offers versatility, as photoresist types and process parameters can be adjusted to suit the application. Additionally, the device also helps reduce material and labor costs, as the exposure process is fast and efficient. Finally, it includes an automated die inspection system, which helps prevent defects caused by incorrect exposure levels or improper exposure conditions. Overall, CS450 photoresist unit is a highly advanced and sophisticated machine, enabling users to successfully fabricate and pattern circuits for semiconductor applications. It offers high-resolution capabilities, and features a large exposure stage, a high‐resolution projection exposure tool and an advanced light source. It can also support a variety of photoresist types and process parameters, and includes an automated die inspection asset, thus greatly reducing the risk of defects during the production process.