Used TEL / TOKYO ELECTRON CS450 #9411470 for sale

TEL / TOKYO ELECTRON CS450 Photoresist Equipment is an integrated photolithography system designed for high-precision photoresist applications, enabling users to optimize their microfabrication processes. The unit allows users to produce precision patterns of submicron features necessary for the production of advanced semiconductor products and other high-end electronic components. TEL CS450 features a deep-UV uniformity illuminator that supports large substrates with a size of up to 200mm. It also features a dual axis programmable motorized machine for precise positioning and ablation. With its high resolution projection optics, it can expose substrates at a maximum resolution of 0.05µm. The tool also features a 7-stage pressure-filtration asset with a flow rate of 650 cc/min and a total pressure of 0.1MPa to achieve optimal uniformity of the original image patterns. In addition, a nitrogen purge is even more effective at reducing particle contamination. The model is easy to operate with its user-friendly interface, and it can be used to produce a wide range of device components, including wafer-level integration, photomask patterning, and other microfabrication processes. It also comes with advanced inspection and metrology tools, such as surface measurement and defect inspection, to guarantee perfect process performance. By integrating all within the same equipment, users can quickly and easily perform repeatable and reliable photoresist processes with a guaranteed yield of high-precision micro-components. The system also features an advanced illumination control module with a proprietary image distortion correction algorithm, allowing for accurate and consistent exposure to the photoresist material. This helps ensure the optimal final product by reducing failure rates, thereby maximizing production efficiency. Overall, TOKYO ELECTRON CS 450 Photoresist Unit is designed to provide users with reliable and exacting photoresist processes for the production of advanced electronic components. Its versatile features, comprehensive functionality, and reliable performance make it an ideal solution for high-precision photoresist operations.