Used TEL / TOKYO ELECTRON CS450 #9412551 for sale

TEL / TOKYO ELECTRON CS450 is a photoresist equipment designed for the production of semiconductor devices. This system is used to develop patterns on wafers and patterned media to produce microcircuitry for transistors and other components. TEL CS450 contains a full suite of integrated components that work together to process and develop resist patterns. The components include a resist spin coating unit, a photoresist dispenser, a photoresist editor, a multi-chamber resist process tool, and a mask aligner. The resist spin coating machine is designed to apply a uniform layer of photoresist over the wafer surface. This layer of photoresist is then exposed to different wavelengths of ultraviolet light in order to create a pattern. After exposure, the photoresist dispenser dispenses and photoresists in the desired pattern to the substrate for the development of microcircuitry. The photoresist editor enables precision editing and optimization of the mask pattern for high resolution. It can also use an existing library of mask patterns to generate new designs that precisely match the desired specifications. The multi-chamber resist process tool provides the ideal environment for subsequent photolithography steps. It is equipped with multiple chambers that can accommodate different light sources and allow for simultaneous pattern development on the wafer surface. In addition, TOKYO ELECTRON CS 450 has a mask aligner. This tool is designed to align the pattern on multiple substrates, allowing for a more uniform result over a larger area. The mask aligner also helps to reduce errors when moving the wafer between processes. Finally, CS450 is optimized for accurate and efficient results. It is equipped with several integrated components designed to automate the resist patterning process while keeping a high-level of accuracy. As a result, TOKYO ELECTRON CS450 can produce results with tight tolerances and consistent performance.