Used TEL / TOKYO ELECTRON CS500 #9101357 for sale

ID: 9101357
Vintage: 2001
PEP track system Wafer size: 370 x 470 2001 vintage.
TEL / TOKYO ELECTRON CS500 Photoresist Equipment is an advanced wafer processing system used for developing a great variety of photoresists used in the semiconductor industry. The unit features advanced technological tools such as motorized wafer handling, wafer-leveler, and vacuum wafer rotation with 40° tilt mount. It has a full spectral range of 350-700 nm with precise spectral control, enabling high precision in photoresist exposure and development. The robust machine design provides high throughput with automated process sequence management, wafer recognition, temperature management and strain simulation. Configuration options allow for integration of additional light sources (e.g. DUV, FUV, or POLAR) and modular components (e.g. Image Formation Systems, reflectometry, or Mass Spec). The tool ensures consistent quality from several types of systems, including InGaAs, GeSe, SiC, and SiGe. Featuring advanced automated alignment features such as multi-point global optimization, non-linear grid optimization, and customizable step sequences, the asset offers superior precision and accuracy for photoresist exposure and development. Equipped with an onsite nitrogen line, the model also features a novel nitrogen-assist technology, enabling optimal performance. This nitrogen-assisted high-pressure exposure creates improved adhesion and decreased stress on the photoresist film. Additionally, the equipment offers sub-layer imaging and localized post-exposure baking with CCD or MAM sensitive recipe, which helps in optimizing the etching process. TEL CS500's highly flexible, user-friendly software supports pattern recognition, self-characterization, and customizeable job management. It offers the possibility to manage jobs in various formats, from GDSII to CDF and Xyce, as well as to track pattern-specific operations. In conclusion, TOKYO ELECTRON CS 500 Photoresist System is an advanced and robust wafer processing unit, suitable for a range of semiconductor applications. Its precise spectral range, nitrogen-assisted high-pressure exposure technology, and customizable job management machine render CS 500 highly accurate, reliable, and efficient.
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