Used TEL / TOKYO ELECTRON CS500 #9269632 for sale

TEL / TOKYO ELECTRON CS500 is a state-of-the-art photoresist equipment designed for production of highly precise integrated circuits and other deep-submicron structures. The system combines the high resolution of lithographic optics with a large area handling capability and built-in automation, enabling the user to produce complex and high-performance circuit patterning in an efficient and reliable manner. At the heart of the unit lies TEL proprietary direct-illumination optics technology, which provides superior resolution and contrast for imaging photoresist layers. The optics include a scan-mask projection machine (SMPS) for recording pattern shapes, a Karl Suss MA65 mask aligner with microscope, a binary (x-tal) lens mounted on an XY stage, and a telecentric projector lens. This unique combination of optical components yields unparalleled Linewidth Roughness (LWR) values in the region of 1 nm RMS. TEL CS500 is well equipped for wafer handling and automation including a full servo-driven wafer-stacking tool with anti-particulate protection and precision wafer positioners to ensure parallelism and side-alignment accuracy. This ensures that wafers can be accurately loaded and unloaded from the imaging station quickly and easily. The asset also comes with a comprehensive suite of software tools and features for control and operation. All parameters such as exposure energy, spot size, exposure uniformity, process temperature, and mask alignment accuracy can be precisely controlled from the intuitive computer graphical user interface (GUI). Pre-set recipe recipes and user-defined processes can be stored on the model for rapid turnaround of wafer batches. Overall, TOKYO ELECTRON CS 500 is a highly advanced equipment with advanced features for production of high-requirement integrated circuits and other advanced photoresist structures. Its reliable and accurate imaging capabilities, continuous automation, and comprehensive software suite make it the ideal choice for any commercial photoresist production environment.