Used TEL / TOKYO ELECTRON CS500 #9269637 for sale

TEL / TOKYO ELECTRON CS500
ID: 9269637
System DECO LE4000A Robot Loader.
TEL / TOKYO ELECTRON CS500 is a state-of-the-art photoresist equipment that enables precise control of the etching process. Utilizing a vacuum ultraviolet (VUV) light system, it is able to precisely control the generation of cross-sectional shapes, such as lines and holes, in substrates. The VUV light unit is adjustable to user-specified intensity settings and features a multi-focus machine that increases the uniformity of VUV irradiation across multiple substrates. The tool utilizes a range of photoresist materials to achieve desired outcomes, including positive type and negative type developers for a range of substrates. Through its advanced control asset, TEL CS500 ensures repeatable process results and highly accurate etching. This model is well suited for the creation of complex shapes, as well as for high-volume processing of line and hole etching in substrates such as silicon, polymers, and metals. TOKYO ELECTRON CS 500 has a high-precision metering mechanism and time-controlled development. Thanks to its precision metering equipment, it can adjust the amount of chemicals and exposure time while monitoring the film thickness to ensure uniformity of film thickness across the substrate. The time-controlled development system allows TOKYO ELECTRON CS500 to evaluate and adjust concentration and exposure time as patterns are developed. Additionally, CS 500 has a built-in self-diagnostic program that performs unit and process checks and records the settings for repeatable processing. Along with a comprehensive safety program, TEL CS 500 features a variety of safety features to protect both the user and the machine from potential hazards. Radiation and laser safety measures are in place, and the tool implements strict temperature, pressure, and CO2 monitoring measures to enhance safety. CS500 is a robust asset that sets the industry standard for processing and etching of photoresist materials. Its user-friendly interface, superior control and repeatability, and comprehensive safety measures make it a top-tier choice for photoresist processing and etching.
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