Used TEL / TOKYO ELECTRON CS500 #9269638 for sale

TEL / TOKYO ELECTRON CS500 photoresist equipment is an advanced lithography system designed to enable sophisticated processes in semiconductor fabrication. The unit is used to pattern semiconductor wafers using photomasks in a highly accurate manner. TEL CS500 has a high-performance alignment machine to ensure optimum accuracy and speed during chip fabrication. It is designed to enable reliable and uniform patterns on high-density wafers. The accuracy of the tool is ensured with a high-precision alignment stage with a 10 nanometer resolution capability for a 4" wafer size. The asset also features an advanced data control model to manage wafer process information. It interfaces with the main control equipment to ensure accurate and predictable performance. It also features a high-resolution digital display with a graphical mask editor, allowing for visual inspection of the mask patterning process. TOKYO ELECTRON CS 500 also features an advanced magnetic-field-free (MFF) mode for ultra-wide processing range capability. This mode enables the acquisition of high-quality images by removing certain distortions which can be caused by conducting and permanent magnet materials. The system also comes equipped with a powerful illumination unit, specifically designed to provide illumination uniformity across the entire wafer. This uniformity is essential for realizing patterned chip designs. The illumination machine features asymmetric coaxial illumination and the use of a field lens to improve efficiency. Finally, TEL / TOKYO ELECTRON CS 500 offers a built-in process monitoring tool, allowing for real-time verification of each patterned wafer. This monitoring asset can detect problems such as undesired distortion in mask design, CD and focus errors, providing process engineers with immediate feedback on the manufacturing process. Overall, CS 500 photoresist model is an advanced lithography equipment designed for sophisticated semiconductor processing. It features a wide range of features to ensure accuracy, uniform patterning, and process monitoring, making it an invaluable tool for producing high-quality, complex chip designs.