Used TEL / TOKYO ELECTRON CS500 #9269647 for sale

TEL / TOKYO ELECTRON CS500 Photoresist Equipment is an advanced photolithography system designed for the production of integrated circuits. The unit is a fully automated photolithography machine, making use of the latest in lithography technology to enable chip production at an unprecedented level of accuracy and speed. TEL CS500 has the capability both to expose and develop resist films with a maximum of 24 photo-masks. It can process up to 6,500 wafers per hour and carries a variety of different features to suit customer exacting photolithographic needs. These include a broad range of exposure wavelengths, from deep ultraviolet (DUV) light to X-ray light. The tool also allows for reticle control and wafer stage alignment to ensure accuracy in exposure. TOKYO ELECTRON CS 500 is equipped with an advanced Automatic Alignment Asset (AAS) to ensure that the photoresist layer is correctly positioned during the exposure process. This model takes into consideration both part shape and position data, the x-ray slit alignment, and wafer strain adjusters to make sure a correctly-sized resist layer is produced. The AAS also allows for the adjustment of dose rate settings, which can be adjusted to produce a resist layer of the specified thickness. In addition, CS 500 has a built-in inspection equipment to detect any defects in the photoresist layer after its production. The system is capable of detecting defects down to 3 micrometers, allowing for the quick detection and correction of any films with defects. To ensure that the photoresist is evenly exposed and developed, TEL CS 500 uses an advanced Coherent Beam Array (CBA) exposure unit. This machine features an array of laser beams projected onto the resist layer, ensuring that the light is metered out evenly across the layer. TOKYO ELECTRON CS500 is a powerful lithography tool that can provide greatly increased accuracy and throughput in chip production. Its combination of advanced auto alignment and inspection systems, as well as its beam array exposure asset, make it an indispensable tool in the modern chip production process.