Used TEL / TOKYO ELECTRON CS500 #9269648 for sale

TEL / TOKYO ELECTRON CS500 Photoresist Equipment is an integrated, automated system designed to meet the challenges of advanced semiconductor device fabrication. TEL CS500 is equipped with a Chemical Strip module that provides superior strip performance for removing photoresist coating from semiconductor wafers. The unit also functions as an automated spin develop and coating unit designed to process photoresist coating and pre-coating solutions with minimal manual intervention. TOKYO ELECTRON CS 500 features a simple, user-friendly touchscreen of operation with automated wafer sizing and sound alarm notification for process disturbances or cleanliness. TEL / TOKYO ELECTRON CS 500 is built for high rate production and flexibility with a wide variety of shift configurations. The machine offers an easy-to-use, intuitive graphical interface for configurable process steps. The tool provides superior accuracy for all applications with a unique Cold Path Heat Exchanger which ensures process uniformity and excellent coating thickness uniformity across the complete wafer area. Additionally, CS 500 includes an advanced chemical dispense mode capable of controlling all dispensing requirements including overspray. TOKYO ELECTRON CS500 is designed to perform both Spin Coating and Spray Coating processes with up to 300 advanced coat recipes. It is integrated with error-free multiple wafer handling for fragile substrates and reliable high accuracy positioning for increased process yield. The advanced self-diagnostic asset includes comprehensive data logging of all essential model components. Additionally, TEL CS 500 offers user-configurable custom reports for automated data analysis. CS500 is a highly reliable chamber environment that protects the wafer quality by taking advantage of a gas purification equipment and filter modules that purify atmosphere and protect wafer surfaces from contamination. The advanced ventilation system is designed to prevent pressure upsets which enables maintained high vacuum levels. Further, the unit uses an advanced wafer handling mechanism which ensures complete edge contamination control, with flexibility between automatic batch and single wafer processing. TEL / TOKYO ELECTRON CS500 also provides user-selectable uniform layer and dry-tune technology processes to achieve optimum film uniformity and crystalline perfection. In addition, operators can configure process parameters and setup parameters to best fit the process requirements. This ensures perfect wafer alignment and maximum coating uniformity. Overall, TEL CS500 Photoresist Machine is designed for flexible production with superior performance. The tool offers enhanced process accuracy, repeatability and throughput. Its intuitive touchscreen interface and self-diagnostic asset ensure easy operation and efficient process control. TOKYO ELECTRON CS 500 is an ideal solution for advanced semiconductor device fabrication.