Used TEL / TOKYO ELECTRON CS500 #9269701 for sale

TEL / TOKYO ELECTRON CS500 is a photoresist equipment designed for application on wafers in semiconductor and microelectronics manufacturing. It is capable of handling substrate sizes up to 200mm. TEL CS500 offers the highest resolution available for microlithography, with the ability to expose with sub-quartermicron features. It has a modern design and advanced features to ensure repeatable, reliable results. The system is designed for swift loading and unloading of wafers, making it easy for large-scale production. It features a unique movement mechanism that precisely aligns the substrate, ensuring uniform processing. Additionally, it can be fully automated, providing the most efficient and economical means of photolithography. TOKYO ELECTRON CS 500 uses a laser-based device to irradiate the wafer surface, and the exposure dose is adjustable for scalability and optimum performance. It is capable of utilizing multiple photoresist materials including those in the polymethylmethacrylate family, polyimide family, and novolac family. The unit is able to apply a broad range of photoresist films, achieving various micron-scale patterns with precise uniformity and coverage. With its integrated process parameters, it can be quickly calibrated to achieve desired results. TEL CS 500 also offers an extensive range of options for fine-tuning process parameters. This includes feature improvements, such as adjustable laser beam intensity or focus, as well as the ability to adjust exposure time. Using these parameters, the machine can be configured to achieve high-quality results regardless of the resistmaterial or pattern. CS 500 is a powerful and highly reliable solution for photoresist applications, providing superior throughput and accurate results. It is a valuable addition to any semiconductor or microelectronics production line.