Used TEL / TOKYO ELECTRON CS500 #9269702 for sale

TEL / TOKYO ELECTRON CS500 is a photoresist equipment designed for high-precision photolithography applications. It has a compact body for easy installation in fabs and cleanrooms, and is capable of producing masks and patterns with excellent repeatability and accuracy. TEL CS500 utilizes a high-precision stage and scanning laser system to accurately control the movement of the substrate and photoresist. The stage has a repeatability of 1µm, while the scanner can repeat moving patterns with an accuracy of 0.03µm. It is designed for a wide variety of substrates, including photosensitive glass, GaAs, quartz, and other advanced materials. TOKYO ELECTRON CS 500 utilizes a vacuum chuck and electrostatic capacitance to secure substrates and optimize exposure. Its optics unit is designed to evenly distribute light and reduce intensity heterogeneity errors. The entire machine is able to expose a full mask in timeframes of as short as 10 minutes, and also support step-and-repeat exposure patterns and continuous scanning for large-area masks. Photoresist used with CS 500 is defined precisely by user, allowing developers to control the resolution of the patterns they create. With an exposure range of up to 17mJ/cm2, TOKYO ELECTRON CS500 is suited for a wide variety of applications. It is able to support photomask sizes up to 300mm in diameter, and features an open architecture design to allow for additional systems to be integrated with TEL / TOKYO ELECTRON CS 500. CS500 is designed with minimal maintenance requirements and is networkable for remote monitoring and operation. It is able to communicate with other TEL lithography systems, allowing for better control over production times and workflows. TEL CS 500 is a reliable photoresist tool for high-precision photolithography applications.