Used TEL / TOKYO ELECTRON CS500 #9269704 for sale

TEL / TOKYO ELECTRON CS500 is an innovative photoresist equipment designed for use in semiconductor fabrication processing. Photoresist is a light-sensitive material applied to a substrate, such as a semiconductor wafer, in order to create patterns in the process of fabricating integrated circuits. TEL CS500 system combines a direct imaging technology with patented UV exposure techniques for higher-precision and higher-accuracy photoresist patterning. In addition to its direct imaging technology, TOKYO ELECTRON CS 500 is designed with proprietary methods for exposure to UV light. In this unit, the chamber is configured with two sets of UV lamps that provide highly directional, uniform illumination of the patterns, enabling precise, accurate positioning of the photoresist lines. The light intensity is also adjustable, allowing the user to adjust the machine for different photoresist complexities and line widths. The tool's proprietary exposure techniques are designed to minimize errors caused by optical scattering and interference, producing the highest-quality patterns with the smallest possible line widths. Furthermore, CS500 is equipped with an advanced illumination controller and a precise exposure time setting feature for optimum results. CS 500 asset is also designed with an automated model, including real-time auto dose adjustment features that enable superior and accurate photoresist patterning. The automated equipment can also detect and detect errors, allowing for easy troubleshooting and pattern uniformity adjustment. Furthermore, the system is designed with a low-cost exposure and processing solution combined with software-based process control, friendly user interface, and enhanced process control features. To ensure superior photoresist patterning, TOKYO ELECTRON CS500 unit is also equipped with improved sub micron accuracy and improved resolution beyond the printable capabilities of conventional systems. Additionally, the machine is configured for use with a variety of different substrates, including highly textured and rough surfaces, and can be used for both single-shot and multi-shot exposures. Overall, TEL CS 500 is a pioneering photoresist tool that combines sophisticated UV light exposure techniques and proprietary imaging technologies for superior accuracy and patterning. Its automated asset, advanced illumination controller, improved resolution, and cost-effective solution makes it an ideal photoresist model for a variety of different applications.