Used TEL / TOKYO ELECTRON CS500 #9269707 for sale

TEL / TOKYO ELECTRON CS500
ID: 9269707
System HITACHI LE-4000A.
TEL / TOKYO ELECTRON CS500 is a photoresist equipment designed for device production in the semiconductor and related industries. It is designed to accurately process thin-film photoresist layers using exposure irradiation and etching techniques. This comprehensive system is capable of efficiently and precisely processing various types of thin-film photoresist layers. TEL CS500 is designed to support users in device production, providing high accuracy when processing extremely thin photoresist layers. It is equipped with the latest photolithography equipment, designed to ensure accurate exposure and precise layer thickness control. It uses exposure sources of UV-VIS-IR, allowing users to process photoresist layers that are from 65nm to 5µm thick. TOKYO ELECTRON CS 500 features a high-precision exposure stage, allowing for greater accuracy on smaller substrates. It also has controlled atmospheric dry and wet etch systems, with the ability to accurately control and monitor the etching process. The temperature and pressure levels are adjustable, and the unit is designed to protect the photoresist layers from contamination. CS 500 comes with automated photo resist processing support software, designed to provide users with an efficient and accurate photolithography sequence. This software allows users to easily adjust the variables of the photomask process. TOKYO ELECTRON CS500 machine features a wafer ID technology which tracks the location of the wafers and records the data for accuracy and repeatability. TEL / TOKYO ELECTRON CS 500 is an advanced photoresist tool designed to provide precise and accurate processes for device production. It features a high precision exposure stage, atmospheric dry and wet etch asset and automated photo resist processing support software for optimized photolithography. It also includes wafer ID technology for accurate tracking and data recording. TEL CS 500 is an ideal model to meet the challenges of advanced device production.
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