Used TEL / TOKYO ELECTRON CS500 #9269715 for sale

TEL / TOKYO ELECTRON CS500 is a state-of-the-art photoresist equipment designed to enable efficient manufacturing processes for a wide range of advanced electronic devices. TEL CS500 is equipped with advanced photolithography functions, allowing for precise, complex patterns to be created in small, efficient devices. TOKYO ELECTRON CS 500 combines light source, photoresist, and exposure capabilities for highly accurate and precise photolithography. Its features include a high-power Digital Micromirror Device (DMD) light source, flexible and dynamic 0.5μm proximity exposure system, a wet developer unit, and a dry stepper machine. This integrated equipment suite provides an easy-to-use, high-throughput, and precise lithography capability. In addition, an intuitive graphical user interface facilitates easy, operator-friendly operation. TEL / TOKYO ELECTRON CS 500 will improve manufacturing process yields and reduce the cost of production of products utilizing semiconductor technologies, such as semiconductor devices, printed circuit boards and consumer electronics. The tool creates precise lithographic patterns quickly and easily in small spaces, allowing for highly detailed and complex products. The advanced optics employed by CS 500 ensures resolution accuracy of up to 0.5microns, while also achieving a high contrast resolution of up to 5%. It is also equipped with a wide range of features such as a remote-shutter, coverage uniformity corrections, and servo-drives for active-dithering to minimize defects. Furthermore, its advanced design enables the rapid reprinting of complex patterns with high accuracy and repeatability. CS500 utilizes semiconductor, photoresist materials to ensure ultra-high precision patterning. It is also designed with a shield material to protect the optical asset from wind and dust. The model is also constructed with a dust-extraction feature to enable an ultra-clean photolithography environment. TOKYO ELECTRON CS500 is an advanced photoresist equipment that facilitates highly accurate and precise lithography operations. Its advanced features, optics, materials, and resolution capabilities enable precise, complex patterns to be created quickly and easily in small spaces. It also reduces production costs, improves product performance, and improves yield by correcting coverage uniformity and minimizing defects.