Used TEL / TOKYO ELECTRON CS500 #9269725 for sale

TEL / TOKYO ELECTRON CS500 is a photoresist equipment designed to meet the varied needs of high-volume microelectronic and optoelectronic production. It utilizes advanced imaging and exposure technologies to provide outstanding performance for advanced semiconductor devices. This system is suitable for the photolithography of a variety of photoresist materials ranging from optical thin film to electron beam and X-ray resists. TEL CS500 is equipped with a variety of hardware and software features that enable the user to accurately define the exposure field and focus the wafer for optimal performance. It has an enhanced high resolution pattern generator to ensure superior geometry fidelity, edge sharpness, and depth of focus, as well as an alignment camera which lowers reticle error. Additionally, the software's built-in database of exposure parameters enables users to quickly call up previously used exposure settings with no further data input. TOKYO ELECTRON CS 500 also incorporates a number of features which optimize practical use of the unit. It is equipped with a maintenance free, 50 kV wafer stage, which eliminates the need for manual adjustment of the wafer position to maintain edge sharpness. Additionally, its advanced automated wafer handling features allow multiple wafers to be loaded and unloaded at once, greatly reducing cycle times. The advanced software and hardware features of TEL CS 500 ensure highly reliable performance, guaranteeing consistent yields. By taking advantage of its on-board maskless photolithographic capabilities, it is ideal for high-volume production environments which call for the highest levels of productivity. In addition, the machine's intrinsic flexibility makes it capable of rapidly adjusting to changing production technologies, such as changing light sources. All in all, TEL / TOKYO ELECTRON CS 500 is a state-of-the-art photoresist tool that provides users with unparalleled performance and reliability. With the advanced imaging and exposure technologies, it can easily fulfill the needs of today's demanding production restive environments.