Used TEL / TOKYO ELECTRON CS500 #9269765 for sale

TEL / TOKYO ELECTRON CS500 is a state-of-the-art photoresist equipment capable of performing both high-resolution photolithography and dry etch processes. The system is designed to provide precise patterning of sub-micrometer geometries which are then used in the creation of integrated microelectronic devices. The unit has a chamber with a removable electrostatic chuck for both planarizing and patterning. Inside the machine, there is a block composed of a resist material and a specialized substrate. The electrostatic chuck levitates the block and precisely controls the wafer in both speed and position. To perform lithography processes, TEL CS500 utilizes an advanced, high-resolution light source, such as a KrF or ArF excimer laser. This is used to create the projection image onto the resist via masking or built-in photomask. During this process, UV radiation interacts with the resist, creating an image that responds according to the mask structure. After the lithography step, the tool utilizes a dynamic backside bias generator for dry etch applications. This feature uses a power supply to generate a negatively charged square-wave bias, which is applied at various points on the wafer. With this bias, the asset can etch patterns into the resist material. In addition, TOKYO ELECTRON CS 500 also has a temperature-controlled environment which makes it possible to perform processes in different temperatures. This helps optimize the resolution of the device in order to achieve the desired patterning results. In addition to its high-resolution lithography and etch capabilities, TEL CS 500 also features an in-line inspection tool which allows for on-the-fly monitoring of device structure. This enables immediate adjustment of processes in order to produce a more accurate device. Finally, the model is equipped with a user-friendly interface, which allows for accurate monitoring and control over all processes. This helps make the entire process smoother and more efficient. CS500 is thus a powerful tool for any advanced photolithography and dry etching process needs.