Used TEL / TOKYO ELECTRON CS500 #9412547 for sale

TEL / TOKYO ELECTRON CS500 is a photoresist equipment designed for high-precision, high-efficiency photolithography. The system employs advanced production principles for use in the semiconductor, optoelectronics and disk drive manufacturing industries. TEL CS500 is equipped with a 325-mm field spin-assisted stepper motion control, allowing for precise and fast advancements in the wavelength range between 248 and 419 nm. The unit also includes a special NIR-driven shutter, enabling higher resolution yields and fewer process steps. TOKYO ELECTRON CS 500 utilizes a twin-lens design, with a VIS/NIR objective and a UV objective. The UV objective is both carbon-fiber corrected and glass-fiber corrected. The lenses on the machine have a total numerical aperture of 0.90 (NA) to ensure high-performance imaging. With its visual lamp, TOKYO ELECTRON CS500 offers the capability of automatically recognizing the mask pattern even with a small minimum feature size, vastly reducing the need for manual adjustments. Aided by the Dual-Track Flatness Measurement Tool and side-by-side scatterometry, TEL / TOKYO ELECTRON CS 500 can accurately monitor results during the process. CS500 also features a new Hardened Polarizer, allowing for precise adjustment of the imaging or illumination direction under extreme operation conditions. This reduces the performance loss of polarization elements, resulting in improved uniformity and suppression of flare. TEL CS 500 incorporates precise motion control with a closed-loop stage, which features a high-resolution Position Sensor that provides complete and accurate feedback for target scanning. This not only improves positional accuracy, but it also guarantees higher throughput and better process performance. The asset is equipped with a user-friendly Human Machine Interface (HMI), making it easy to operate and customize processes. The HMI is also equipped with a data logging model, enabling secure and traceable data tracking and retrieval of process results. CS 500 provides precise, repeatable photoresist results, resulting in reduced imaging yield loss, improved process stability, higher throughput, and more effective customers service satisfaction. With its combination of advanced imaging and process technologies, the equipment is an ideal choice for precision semiconductor manufacturing.