Used TEL / TOKYO ELECTRON CS800S #9383288 for sale

TEL / TOKYO ELECTRON CS800S Photoresist Equipment is a cutting-edge photolithography solution utilized in the semiconductor industry to enable high precision nanofabrication. The system features an advanced set of integrated optics, allowing for greater resolution than any other photolithography unit available. The resolved features can be as small as 100nm, with a typical machine of resolution of 5-10 microns. The tool operates through a "step-and-repeat" approach which involves imaged onto film placed on a rotating drum, and then positioned precisely to create multiple images on a single substrate. The light source of the asset is a UV laser which is facilitated by a wide array of integration lenses to create high resolution patterns in a highly efficient manner. In addition to the improved resolution, TEL CS800S offers high throughput. This is enabled by a unique slit scanning approach and an advanced precursor treatment technology (PAAA) to enable faster process times. To further improve the process, precise alignment is enabled by an optical metrology model with a wide range of angles, depths, and X-Y coordinates, minimizing variations in the patterns. Furthermore, the equipment includes a high-throughout wafer exposure station with large apertures to reduce process times. This station is also utilized for post-processing to ensure that the final product meets or exceeds the required quality metrics. Overall, TOKYO ELECTRON CS-800S is a top-of-the-line photolithography solution that can be utilized to create nanofabrication with superior resolution, high throughput, and improved production times. The system is also highly customizable with advanced integration lenses, PAAA technology, and precision alignment metrology helping to further maximize the potential of the unit. Together, these features create a truly revolutionary photolithography solution.