Used TEL / TOKYO ELECTRON Hot plates for ACT 12 #293650996 for sale
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ID: 293650996
TEL / TOKYO ELECTRON Hot plates for ACT 12 is a photoresist equipment designed for microelectronic device fabrication. It is designed to provide a precise and controlled thermal environment for substrate growth, exposure, and development. The system is capable of generating highly repeatable and precise temperatures in the range of 10 to 300ºC. The hot plate is comprised of a thermally conductive, flat non-magnetic base plate, an additional heater plate, a temperature control unit (TCU), and an insulated mechanical compression unit which creates a pressure-tight connection between the heater plate and the base plate. The thermal plate has an evenly distributed temperature profile and is constructed with an advanced combination of low thermal mass ceramic, resin and other materials for optimal temperature control and uniformity. The TCU is used to accurately control the temperature of the hot plate, allowing it to reach and maintain target temperatures quickly and accurately. The heater plate consists of a Peltier type heating device with a platform on top that contains the micro-patch thermal plates and the substrate. TEL Hot plates for ACT 12 is operated using a digital activity controller. The activity controller features a range of options for controlling the operation of the machine including temperature set points, cooling timing, on/off cycle, cooling duration and heater preheat profiles. Additionally, the digital activity controller also includes advanced monitoring functions to ensure the tool is operating accurately and efficiently. TOKYO ELECTRON Hot plates for ACT 12 asset is designed to provide precise and consistent thermal properties while minimizing thermal diffusion to the surrounding environment. Additionally, the model offers improved wafer-to-wafer yield, increased top-surface planarity and improved operator safety and environmental stability. The equipment can also be used for processes such as lithography, deposition, implantation, etching, and infusion processes.
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