Used TEL / TOKYO ELECTRON Interface for Clean Track Mark 8 #9409933 for sale

TEL / TOKYO ELECTRON Interface for Clean Track Mark 8 is a fully automated photoresist processing equipment that provides a cost effective and efficient way to pattern wafer surfaces with a high level of accuracy and repeatability. The system is designed to integrate with most cleaning equipment and can be used to process a wide variety of photoresist solutions. The interface features a variable diameter track spacing and a pressure regulator to ensure optimal results. The unit utilizes a light projector to project the desired photoresist pattern onto the wafer. The light source used by the projector is a UV LED, which is emitted in a stable, controlled wavelength and flux. The track size of the Clean Track Mark 8 is adjustable, allowing for more flexibility when processing photoresist materials. A range of different optical attributes such as reflectivity are also adjustable. The machine maintains a high level of accuracy and repeatability with its precise coordinate stages. The stage uses X-Y-Z motions to accurately move the wafer and the photoresist solution. The precision of the stages helps to ensure a uniform pattern is formed. The tool also has a well-protected control unit, which is designed to guard against dust and humidity. It is equipped with a in-built safety asset that analyzes operational and environmental conditions to ensure optimum performance. The Clean Track Mark 8 has been designed for ease of use and maintenance with its automated operations and clear manual instructions. It uses a user-friendly touch panel to quickly and easily operate the model. The equipment is incredibly effective in producing highly accurate and high-resolution patterns on a wide variety of wafer substrates. It is capable of minimizing contamination and particle-count, which is essential when processing photoresist materials. TEL Interface for Clean Track Mark 8 is a reliable system for quickly and efficiently creating precise photoresist patterns on any type of wafer surface. Its accuracy, speed, and user-friendly interface make it an attractive option for those looking for a cost effective and efficient photoresist processing unit.