Used TEL / TOKYO ELECTRON LITHIUS ARF #9303277 for sale

TEL / TOKYO ELECTRON LITHIUS ARF
ID: 9303277
Coater / Developer system.
TEL / TOKYO ELECTRON LITHIUS ARF is a kind of photoresist equipment developed and manufactured by TEL, Ltd., a leading provider of semiconductor and thin film fabrication equipment. The system is designed to optimize and streamline the lithography process for chip fabrication. TEL LITHIUS ARF unit is comprised of two main components: the ARF machine and the deposition tool. The ARF asset includes an automated resist loader (ARL), an automated resist developer (ARD), and a wafer inspection robot (WIR). The ARL loads the wafers onto the ARD, which then deposits the required photoresist based on user-defined parameters. The WIR then performs an inspection of each wafer to verify that the resist has been consistently deposited and that the wafer surface quality is satisfactory. The deposition model consists of a micrometer spindle for precise control of film thickness, a reaction chamber for controlling the reaction environment, a pre- and post-exposure module for precise adjustment of light intensity, and an exhaust equipment for semi-continuous processing of up to 25 wafers. The deposition system uses advanced deposition control algorithms to ensure uniform resist thickness on each wafer. The combination of the ARF unit and the deposition machine enables consistent, high-quality exposures of the photoresist, with tight control of the reaction temperature and precision control over the degree of exposure. The reaction chamber is also designed to minimize contaminants and maximize yields. The tool uses a "just-in-time" loading asset, which reduces unnecessary downtime by ensuring that wafers are not left exposed to the atmosphere for extended periods of time. Additionally, TOKYO ELECTRON LITHIUS ARF can be easily integrated with other systems, such as steppers, scanners, and annealers, making it well-suited for use in high-volume production environments. LITHIUS ARF is one of the most advanced photoresist systems available, offering superior precision, reliability, and performance in an efficient and cost-effective package.
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